VUV Process Development

Customized Processes for Surface Modification

Mechanismen zur Oberflächenaktivierung mittels VUV-Bestrahlung.
© Fraunhofer IFAM
Mechanisms for surface activation via VUV irradiation

Vacuum ultraviolet radiation (VUV radiation) can be used to clean, activate, modify, and coat surfaces. The decisive process parameter is the effective VUV dose, namely the radiation that actually reaches the surface. This depends on the type of lamp used, the distance of the lamp from the substrate – and hence also the component geometry –, the duration of the treatment, and the process atmosphere. Atmospheric oxygen in particular plays an important role because VUV radiation is absorbed by oxygen. This results in ozone and reactive atomic oxygen which also react with the substrate surface.

In general the desired reaction mechanisms depend on the substrate material respectively the desired surface functionality. The experts of Plasma Technology and Surfaces PLATO at Fraunhofer IFAM carry out VUV process development for customers specially tailored to their individual requirements.